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Extreme ultraviolet lithography (EUVL) is an advanced, highly precise lithography technique that allows for the manufacturing of microchips with features small enough to support 10 Ghz clock speeds.
EUVL makes use of super-charged xenon gas, which emits ultraviolet light and uses very precise micro-mirrors to focus the light onto the silicon wafer to produce even finer feature widths.
In contrast, EUVL technology uses an ultraviolet light source and lenses to focus the light. This is not as precise because of the limitation of the lenses.
The EUVL process is as follows: